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Vapor Deposition Film Forming Method

Aug 09, 2016

A prominent advantage is that the polyimide dianhydride monomer with a diamine at a low temperature reaction without any catalyst. At the same time does not produce any by-products formed when the polyamic acid prepolymer. In the process of thermal imidization released only water, while most dianhydride as a monomer at a temperature and a diamine having a sufficiently high vapor pressure. Therefore, you can use a method of forming a vapor deposition on a substrate. The advantages of the vapor deposited film forming in the tip is sharp edges or tip. It may be uniformly covered with more complex structures. These are occasions for the sake of the coating solution for the surface tension can’t be achieved.